Issued Patents 2019
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10460942 | Method of manufacturing semiconductor structure | Po-Chi Wu, Chih-Han Lin, Horng-Huei Tseng | 2019-10-29 |
| 10431687 | Structure and formation method of semiconductor device structure | Chih-Han Lin | 2019-10-01 |
| 10396184 | Integrated circuit device fins | Chih-Han Lin, Wei-Chiang Hung, Wei-Hao Huang | 2019-08-27 |
| 10395983 | Method of forming trenches | Chih-Han Lin | 2019-08-27 |
| 10366926 | Structure and formation method of semiconductor device structure | Chih-Han Lin | 2019-07-30 |
| 10367079 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Jr-Jung Lin, Shih-Hao Chen, Chih-Han Lin, Mu-Tsang Lin, Yung-Jung Chang | 2019-07-30 |
| 10366990 | Fin field effect transistor and semiconductor device | Chih-Han Lin, Horng-Huei Tseng | 2019-07-30 |
| 10366915 | FinFET devices with embedded air gaps and the fabrication thereof | Chih-Han Lin | 2019-07-30 |
| 10355110 | FinFET and method of forming same | Po-Chi Wu, Chih-Han Lin, Horng-Huei Tseng | 2019-07-16 |
| 10355135 | Semiconductor structure and fabricating method thereof | Tung-Wen Cheng, Chang-Yin Chen, Mu-Tsang Lin | 2019-07-16 |
| 10340382 | Embedded source or drain region of transistor with downward tapered region under facet region | Tung-Wen Cheng, Yung-Jung Chang, Zhe Zhang | 2019-07-02 |
| 10332790 | Fin field effect transistor (FinFET) device structure with interconnect structure | Chih-Han Lin | 2019-06-25 |
| 10332879 | Fin-type field effect transistor structure and manufacturing method thereof | Chih-Han Lin | 2019-06-25 |
| 10326005 | Structure and formation method of semiconductor device structure | Jui-Ping Chuang, Chen-Hsiang Lu, Wei-Ting Chen, Yu-Cheng Liu | 2019-06-18 |
| 10312352 | Gate structure of field effect transistor with footing | Chang-Yin Chen, Jr-Jung Lin, Chih-Han Lin, Yung-Jung Chang | 2019-06-04 |
| 10304774 | Semiconductor structure having tapered damascene aperture and method of the same | Wei-Ting Chen, Chen-Hsiang Lu, Yu-Cheng Liu | 2019-05-28 |
| 10283641 | Contact structures, FinFET devices and methods of forming the same | Chih-Han Lin, Horng-Huei Tseng | 2019-05-07 |
| 10283605 | Self-aligned metal gate etch back process and device | Chih-Han Lin, Horng-Huei Tseng | 2019-05-07 |
| 10269793 | Source/drain regions in fin field effect transistors (FinFETs) and methods of forming same | Chih-Han Lin, Horng-Huei Tseng | 2019-04-23 |
| 10269940 | Semiconductor device and method | Bo-Feng Young, Po-Chi Wu | 2019-04-23 |
| 10269908 | FinFET and method of forming same | Chih-Han Lin, Horng-Huei Tseng | 2019-04-23 |
| 10269795 | Semiconductor structure and manufacturing method thereof | Chih-Han Lin, Horng-Huei Tseng | 2019-04-23 |
| 10269794 | Semiconductor device and method of manufacture | Chai-Wei Chang, Po-Chi Wu | 2019-04-23 |
| 10269650 | Structure and formation method of semiconductor device structure | Chih-Han Lin | 2019-04-23 |
| 10263113 | Semiconductor device and method | Chih-Han Lin, Horng-Huei Tseng | 2019-04-16 |