Issued Patents 2019
Showing 26–26 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10170609 | Internal spacer formation from selective oxidation for Fin-first wire-last replacement gate-all-around nanowire FET | Szu-Lin Cheng, Gen P. Lauer, Isaac Lauer | 2019-01-01 |