Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10385236 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Reza Golzarian +3 more | 2019-08-20 |
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Michael Lauter, Yongqing Lan, Robert REICHARDT, Alexandra Muench +4 more | 2019-03-12 |