Issued Patents 2018
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9927706 | Atomic layer chemical patterns for block copolymer assembly | Paul Franklin Nealey, Tzu-Hsuan Chang, Zhenqiang Ma, Michael Scott Arnold, Robert Michael Jacobberger | 2018-03-27 |