Issued Patents 2018
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10158000 | Low-K dielectric sidewall spacer treatment | Chia-Chun Lan | 2018-12-18 |
| 10158006 | Source/drain structure of a fin field effect transistor (FinFET) | Chih-Shan Chen | 2018-12-18 |
| 10158007 | Semiconductor device and manufacturing method thereof | Feng-Cheng Yang, Ting-Yeh Chen | 2018-12-18 |
| 10158017 | Semiconductor structure and method for semiconductor device fabrication with improved source drain epitaxy | Tzu-Hsiang Hsu, Ting-Yeh Chen, Feng-Cheng Yang | 2018-12-18 |
| 10153344 | Formation of dislocations in source and drain regions of FinFET devices | Chun Hsiung Tsai, Wei-Yuan Lu, Chien-Tai Chan, Da-Wen Lin | 2018-12-11 |
| 10134902 | PMOS FinFET | Chia-Chun Lan, Chia-Ling Chan, Feng-Cheng Yang, Yen-Ming Chen | 2018-11-20 |
| 9865504 | Semiconductor device and manufacturing method thereof | Feng-Cheng Yang, Ting-Yeh Chen | 2018-01-09 |