| 10115666 |
Method for making a photolithography mask intended for the formation of contacts, mask and integrated circuit corresponding thereto |
Patrick Regnier |
2018-10-30 |
| 10049982 |
Method for forming at least one electrical discontinuity in an interconnection part of an integrated circuit without addition of additional material, and corresponding integrated circuit |
Christian Rivero, Pascal Fornara, Mathieu Lisart |
2018-08-14 |
| 10049991 |
Method for forming at least one electrical discontinuity in an interconnection part of an integrated circuit, and corresponding integrated circuit |
Christian Rivero, Pascal Fornara, Mathieu Lisart |
2018-08-14 |
| 10043741 |
Low-dispersion component in an electronic chip |
François Tailliet |
2018-08-07 |
| 9899476 |
Integrated circuit comprising components, for example NMOS transistors, having active regions with relaxed compressive stresses |
Pascal Fornara, Christian Rivero |
2018-02-20 |