NP

Naresh Kumar Penta

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #19 of 43Top 45%
📍 Newark, DE: #27 of 138 inventorsTop 20%
🗺 Delaware: #186 of 598 inventorsTop 35%
Overall (2018): #293,036 of 503,207Top 60%
1
Patents 2018

Issued Patents 2018

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10119048 Low-abrasive CMP slurry compositions with tunable selectivity Yi Guo, David Mosley 2018-11-06