Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9916974 | Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition | Se Jin JANG, Jong Hyun Kim, Sung-Gi Kim, Sang Yong Jeon, Byeong-il YANG +3 more | 2018-03-13 |