ML

Mark Lefebvre

Dow Global Technologies: 4 patents #41 of 857Top 5%
RM Rohm And Haas Electronic Materials: 4 patents #7 of 131Top 6%
📍 Hudson, NH: #3 of 30 inventorsTop 10%
🗺 New Hampshire: #96 of 1,557 inventorsTop 7%
Overall (2018): #40,079 of 503,207Top 8%
4
Patents 2018

Issued Patents 2018

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
10100421 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole and bisepoxide compounds Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Joanna Dziewiszek +1 more 2018-10-16
10104782 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of pyridyl alkylamines and bisepoxides Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Joanna Dziewiszek +1 more 2018-10-16
10006136 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of imidazole compounds, bisepoxides and halobenzyl compounds Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Julia Kozhukh +1 more 2018-06-26
9932684 Method of electroplating photoresist defined features from copper electroplating baths containing reaction products of alpha amino acids and bisepoxides Matthew Thorseth, Zuhra I. Niazimbetova, Yi Qin, Julia Woertink, Joanna Dziewiszek +1 more 2018-04-03