| 10153294 |
Method of ONO stack formation |
— |
2018-12-11 |
| 10128258 |
Oxide formation in a plasma process |
Jeong Soo Byun |
2018-11-13 |
| 10079314 |
Nonvolatile charge trap memory device having a deuterated layer in a multi-layer charge-trapping region |
Sagy Levy, Frederick B. Jenne |
2018-09-18 |
| 10079243 |
Method of integrating a charge-trapping gate stack into a CMOS flow |
— |
2018-09-18 |
| 10062573 |
Embedded SONOS with triple gate oxide and manufacturing method of the same |
Igor G. Kouznetsov, Venkatraman Prabhakar, Ali Keshavarzi |
2018-08-28 |
| 10020317 |
Memory device with multi-layer channel and charge trapping layer |
Renhua Zhang, Lei Xue, Rinji Sugino |
2018-07-10 |
| 10002878 |
Complementary SONOS integration into CMOS flow |
Venkatraman Prabhakar, Igor G. Kouznetsov |
2018-06-19 |
| 9997641 |
SONOS ONO stack scaling |
Fredrick B. Jenne, Sagy Levy |
2018-06-12 |
| 9997528 |
Complimentary SONOS integration into CMOS flow |
Venkatraman Prabhakar, Igor G. Kouznetsov |
2018-06-12 |
| 9929240 |
Memory transistor with multiple charge storing layers and a high work function gate electrode |
Igor Polishchuk, Sagy Levy |
2018-03-27 |
| 9922988 |
Embedded SONOS based memory cells |
Igor G. Kouznetsov, Venkatraman Prabhakar |
2018-03-20 |
| 9911747 |
Integration of a memory transistor into high-k, metal gate CMOS process flow |
— |
2018-03-06 |
| 9911746 |
Integration of a memory transistor into high-k, metal gate CMOS process flow |
— |
2018-03-06 |
| 9911613 |
Method of fabricating a charge-trapping gate stack using a CMOS process flow |
Hui-Mei Shih |
2018-03-06 |
| 9893172 |
Methods to integrate SONOS into CMOS flow |
Venkatraman Prabhakar |
2018-02-13 |