Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9960275 | Method of fabricating air-gap spacer for N7/N5 finFET and beyond | Chih-Yang Chang, Raymond Hung, Tatsuya Sato, Nam Sung Kim, Shiyu Sun | 2018-05-01 |
| 9865735 | Horizontal gate all around and FinFET device isolation | Shiyu Sun, Naomi Yoshida, Theresa Kramer Guarini, Sung Won Jun, Vanessa Pena +4 more | 2018-01-09 |