Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9601600 | Processes for fabricating FinFET structures with semiconductor compound portions formed in cavities and extending over sidewall spacers | Yu-Hsiang Hung, Ssu-I Fu, Chung-Fu Chang, Yen-Liang Wu, Chien-Ting Lin | 2017-03-21 |