NU

Naohisa Ueno

TC Tokyo Ohka Kogyo Co.: 2 patents #24 of 105Top 25%
Overall (2017): #119,906 of 506,227Top 25%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9796953 Cleaning liquid for lithography and method for cleaning substrate Tomoya Kumagai, Mai Sugawara 2017-10-24
9535330 Stripping solution for photolithography and pattern formation method Yuriko Shirai, Takuya Ohhashi 2017-01-03