Issued Patents 2017
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9570304 | Method of forming fine patterns in an anti-reflection layer for use as a patterning hard mask | Min Ju Park, Hyojin Yun, Kyoungseon Kim, Su Min Kim, Hyunwoo KIM +2 more | 2017-02-14 |