Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9773872 | Method of manufacturing a semiconductor device to prevent occurrence of short-channel characteristics and parasitic capacitance | Yoshiki Yamamoto, Hideki Makiyama, Toshiaki Iwamatsu | 2017-09-26 |
| 9722044 | Manufacturing method of semiconductor device with silicon layer containing carbon | Toshiaki Iwamatsu | 2017-08-01 |