| 9828457 |
Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film |
Yusuke Sato, Seiji Kimoto |
2017-11-28 |
| 9765175 |
Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating |
Yusuke Sato |
2017-09-19 |
| 9550723 |
Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition |
Takakazu Kage, Dongmi Shin |
2017-01-24 |