Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9660182 | Plasma processing method and plasma processing apparatus | Daisuke Urayama, Masato Kushibiki, Nao Koizumi, Wataru Kume, Eiichi Nishimura +1 more | 2017-05-23 |
| 9647206 | Method for etching layer to be etched | Mitsuru Hashimoto, Eiichi Nishimura, Keiichi Shimoda | 2017-05-09 |