Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9796063 | Multi-layered chemical-mechanical planarization pad | Anoop Mathew, Guangwei Wu, Scott Xin Qiao, Oscar K. Hsu, David Adam Wells +2 more | 2017-10-24 |
| 9649742 | Polishing pad having polishing surface with continuous protrusions | William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns +2 more | 2017-05-16 |
| 9597769 | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer | William C. Allison, James P. LaCasse, Diane Scott, Alexander William Simpson, Ping Huang +1 more | 2017-03-21 |