Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9841678 | Photosensitive resin composition, photosensitive element, semiconductor device and method for forming resist pattern | Tetsuya Kato, Masahiko Ebihara | 2017-12-12 |
| 9829791 | Photosensitive resin composition, photosensitive element, semiconductor device and method for forming resist pattern | Tetsuya Kato, Masahiko Ebihara, Yasuharu Murakami | 2017-11-28 |