Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9786576 | Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device | Takumi Ueno, Alexandre Nicolas, Ken Nanaumi | 2017-10-10 |
| 9633848 | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device | Yu Aoki, Shigeru Nobe, Kei Kasuya, Akitoshi Tanimoto, Shingo Tahara | 2017-04-25 |