| 9824895 |
Method of integration of ONO stack formation into thick gate oxide CMOS flow |
— |
2017-11-21 |
| 9793125 |
SONOS stack with split nitride memory layer |
Fredrick B. Jenne |
2017-10-17 |
| 9793284 |
Method of ONO stack formation |
— |
2017-10-17 |
| 9741803 |
Nonvolatile charge trap memory device having a deuterated layer in a multi-layer charge-trapping region |
Sagy Levy, Fredrick B. Jenne |
2017-08-22 |
| 9721962 |
Integration of a memory transistor into high-k, metal gate CMOS process flow |
— |
2017-08-01 |
| 9716153 |
Nonvolatile charge trap memory device having a deuterated layer in a multi-layer charge-trapping region |
Sagy Levy, Fredrick B. Jenne |
2017-07-25 |
| 9620516 |
Embedded SONOS based memory cells |
Igor G. Kouznetsov, Venkatraman Prabhakar |
2017-04-11 |
| 9548348 |
Methods of fabricating an F-RAM |
Shan Sun, Thomas E. Davenport, Kedar Patel |
2017-01-17 |
