Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9678425 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | Haruhiko Komoriya, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto | 2017-06-13 |
| 9678426 | Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation | Haruhiko Komoriya, Kenjin Inomiya, Takashi Mori, Takamasa Kitamoto, Yusuke Kanto | 2017-06-13 |
| 9650451 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | Haruhiko Komoriya, Kazuhiko Maeda | 2017-05-16 |