Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9828527 | Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid | Peter Przybylski, Zhenyu Bao, Julian Proelss | 2017-11-28 |
| 9765239 | Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material | Peter Przybylski, Zhenyu Bao, Julian Proelss | 2017-09-19 |