TO

Takahiro Onoue

HO Hoya: 1 patents #36 of 128Top 30%
📍 Shinjuku, JP: #8 of 25 inventorsTop 35%
Overall (2016): #210,491 of 481,213Top 45%
1
Patents 2016

Issued Patents 2016

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9383637 Substrate with multilayer reflective film, reflective mask blank for EUV lithography, method of manufacturing reflective mask for EUV lithography and method of manufacturing semiconductor device Toshihiko Orihara 2016-07-05