JK

Jun Koshiyama

TC Tokyo Ohka Kogyo Co.: 2 patents #24 of 95Top 30%
Overall (2016): #127,660 of 481,213Top 30%
2
Patents 2016

Issued Patents 2016

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9291905 Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography Tomoya Kumagai, Naohisa Ueno 2016-03-22
9244358 Surface treatment liquid, surface treatment method, hydrophobilization method, and hydrophobilized substrate Kazumasa Wakiya 2016-01-26