Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9490254 | Fin sidewall removal to enlarge epitaxial source/drain volume | Ru-Shang Hsiao, Chien-Hsun Lin, Yu-Chang Liang, Kuan-Yu Chen, Li-Yi Chen | 2016-11-08 |
| 9252233 | Air-gap offset spacer in FinFET structure | Ru-Shang Hsiao, Rou-Han Kuo, Ting-Fu Lin, Tzung-Da Liu, Li-Yi Chen | 2016-02-02 |