Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9437428 | Method of manufacturing a semiconductor device having an oxide semiconductor layer with increased hydrogen concentration | Masashi Oota, Noritaka Ishihara, Motoki NAKASHIMA, Shunpei Yamazaki, Yasuharu HOSAKA +2 more | 2016-09-06 |
| 9267199 | Method for manufacturing sputtering target, method for forming oxide film, and transistor | Shunpei Yamazaki, Masashi TSUBUKU, Masashi Oota, Noritaka Ishihara | 2016-02-23 |