PL

Paul J. LaBeaume

RM Rohm And Haas Electronic Materials: 4 patents #18 of 185Top 10%
Dow Global Technologies: 1 patents #300 of 820Top 40%
📍 Auburn, MA: #3 of 10 inventorsTop 30%
🗺 Massachusetts: #751 of 12,163 inventorsTop 7%
Overall (2016): #37,097 of 481,213Top 8%
4
Patents 2016

Issued Patents 2016

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
9527936 Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method Vipul Jain, James W. Thackeray, James F. Cameron, Suzanne M. Coley, Amy M. Kwok +1 more 2016-12-27
9499513 Acid generators and photoresists comprising same James F. Cameron, Vipul Jain, Jin Wuk Sung, James W. Thackeray 2016-11-22
9500947 Acid generator compounds and photoresists comprising same Aaron A. Rachford, Vipul Jain 2016-11-22
9304394 Aryl acetate onium materials 2016-04-05