JW

Jiun-Fang Wang

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #17 of 34Top 50%
📍 Hsinchu, NJ: #8 of 23 inventorsTop 35%
Overall (2016): #354,565 of 481,213Top 75%
1
Patents 2016

Issued Patents 2016

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
9299585 Method for chemical mechanical polishing substrates containing ruthenium and copper Hongyu Wang, Lee Melbourne Cook, Ching-Hsun Chao 2016-03-29