Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9240505 | Method of etching backside Si substrate of SOI substrate to expose SiO2 layer using fluonitric acid | Tadahiro Ohmi, Tomotsugu Ohashi, Kazuhiro Yoshikawa, Tatsuro Yoshida, Kazuki Soeda +1 more | 2016-01-19 |