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Method for fabricating semiconductor device |
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High-K metal gate process for lowering junction leakage and interface traps in NMOS transistor |
Chih-Wei Yang, Kun-Yuan Lo, Chia-Fu Hsu, Shao-Wei Wang |
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Semiconductor device having spacer with tapered profile |
Chia-Fu Hsu, Chun-Mao Chiou, Shih-Chieh Hsu, Chun-Lung Chen, Lung-En Kuo |
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Semiconductor device and method for fabricating the same |
Chih-Wei Yang, Yu-Feng Liu, Chia-Fu Hsu, En-Chiuan Liou, Ssu-I Fu +11 more |
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Integrated circuit having plural transistors with work function metal gate structures |
Chih-Wei Yang, Yu-Feng Liu, Chia-Fu Hsu, Yu-Ru Yang, En-Chiuan Liou |
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Field-effect transistor and fabricating method thereof |
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2016-04-12 |