Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9482951 | Non-covalently crosslinkable materials for photolithography processes | Runhui Huang, Charles J. Neef, Jinhua Dai, Michael B. Swope | 2016-11-01 |
| 9328246 | Nonpolymeric antireflection compositions containing adamantyl groups | Charlyn Stroud, Jinhua Dai | 2016-05-03 |