Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9372394 | Test pattern layout for test photomask and method for evaluating critical dimension changes | Yuki Fujita, Raymond W. Jeffer, James P. Levin, Joseph L. Malenfant, Jr., Steven C. Nash | 2016-06-21 |