HI

Haruki Inabe

FU Fujifilm: 2 patents #171 of 767Top 25%
Overall (2016): #140,191 of 481,213Top 30%
2
Patents 2016

Issued Patents 2016

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9465292 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same Hiromi Kobayashi 2016-10-11
9316912 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same Hiromi Kobayashi 2016-04-19