AF

Akira Fujimura

D2 D2S: 9 patents #1 of 11Top 10%
Overall (2016): #9,146 of 481,213Top 2%
9
Patents 2016

Issued Patents 2016

Patent #TitleCo-InventorsDate
9465297 Method and system for forming patterns with charged particle beam lithography Ingo Bork 2016-10-11
9448473 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography Michael Tucker 2016-09-20
9400857 Method and system for forming patterns using charged particle beam lithography Anatoly Aadamov, Eldar Khaliullin, Ingo Bork 2016-07-26
9372391 Method and system for forming patterns using charged particle beam lithography with variable pattern dosage Harold Robert Zable 2016-06-21
9343267 Method and system for dimensional uniformity using charged particle beam lithography Kazuyuki Hagiwara, Robert C. Pack 2016-05-17
9341936 Method and system for forming a pattern on a reticle using charged particle beam lithography 2016-05-17
9323140 Method and system for forming a pattern on a reticle using charged particle beam lithography 2016-04-26
9274412 Method and system for design of a reticle to be manufactured using variable shaped beam lithography 2016-03-01
9268214 Method for forming circular patterns on a surface Michael Tucker 2016-02-23