Issued Patents 2016
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9409276 | CMP polishing pad having edge exclusion region of offset concentric groove pattern | Ching-Ming Tsai, Shi Cheng, Kun-Shu Yang, Hui Feng Chen, Gregory T. Gaudet +1 more | 2016-08-09 |