Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7910289 | Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approach | Benjamen M. Rathsack, James Walter Blatchford | 2011-03-22 |
| 7892957 | Gate CD trimming beyond photolithography | — | 2011-02-22 |