Issued Patents 2011
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7964517 | Use of a biased precoat for reduced first wafer defects in high-density plasma process | — | 2011-06-21 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7964517 | Use of a biased precoat for reduced first wafer defects in high-density plasma process | — | 2011-06-21 |