Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8071481 | Method for forming highly strained source/drain trenches | Ta-Wei Kao, Shiang-Bau Wang, Chi-Hsi Wu, Shu-Yuan Ku | 2011-12-06 |
| 8048764 | Dual etch method of defining active area in semiconductor device | Chen-Ping Chen, Tung Ying Lee | 2011-11-01 |