Issued Patents 2011
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058119 | Device scheme of HKMG gate-last process | Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2011-11-15 |
| 8048752 | Spacer shape engineering for void-free gap-filling process | Ming-Yuan Wu, Yi-Shien Mor, Chih-Tang Peng, Chiung-Han Yeh, Harry-Hak-Lay Chuang +1 more | 2011-11-01 |
| 8039381 | Photoresist etch back method for gate last process | Chiung-Han Yeh, Chen-Pin Hsu, Ming-Yuan Wu, Harry-Hak-Lay Chuang | 2011-10-18 |
| 8035165 | Integrating a first contact structure in a gate last process | Chiung-Han Yeh, Ming-Yuan Wu, Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-10-11 |
| 8017473 | Modifying work function in PMOS devices by counter-doping | Chun-Yi Lee, Harry-Hak-Lay Chuang, Ping-Wei Wang | 2011-09-13 |
| 8008145 | High-K metal gate structure fabrication method including hard mask | Shun-Jang Liao, Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2011-08-30 |
| 7998830 | Semiconductor device with both I/O and core components and method of fabricating same | Chung Long Cheng, Sheng-Chen Chung, Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-08-16 |
| 7985690 | Method for a gate last process | Harry-Hak-Lay Chuang, Su-Chen Lai, Gary Shen | 2011-07-26 |
| 7981801 | Chemical mechanical polishing (CMP) method for gate last process | Harry-Hak-Lay Chuang, Su-Chen Lai, Gary Shen | 2011-07-19 |
| 7977202 | Reducing device performance drift caused by large spacings between active regions | Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-07-12 |
| 7977181 | Method for gate height control in a gate last process | Su-Chen Lai, Harry-Hak-Lay Chuang | 2011-07-12 |
| 7977754 | Poly resistor and poly eFuse design for replacement gate technology | Harry-Hak-Lay Chuang | 2011-07-12 |
| 7955964 | Dishing-free gap-filling with multiple CMPs | Ming-Yuan Wu, Chiun-Han Yeh, Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-06-07 |
| 7939392 | Method for gate height control in a gate last process | Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2011-05-10 |
| 7939384 | Eliminating poly uni-direction line-end shortening using second cut | Harry-Hak-Lay Chuang | 2011-05-10 |
| 7927943 | Method for tuning a work function of high-k metal gate devices | Chiung-Han Yeh, Sheng-Chen Chung, Harry-Hak-Lay Chuang | 2011-04-19 |
| 7923321 | Method for gap filling in a gate last process | Su-Chen Lai, Harry-Hak-Lay Chuang, Gary Shen | 2011-04-12 |
| 7919792 | Standard cell architecture and methods with variable design rules | Oscar M. K. Law, Manoj Joshi, Harry-Hak-Lay Chuang | 2011-04-05 |
| 7898037 | Contact scheme for MOSFETs | Harry-Hak-Lay Chuang, Mong-Song Liang, Jung-Hui Kao, Sheng-Chen Chung, Chung Long Cheng +1 more | 2011-03-01 |
| 7868386 | Method and apparatus for semiconductor device with improved source/drain junctions | Chung Long Cheng, Harry-Hak-Lay Chuang | 2011-01-11 |
| 7868361 | Semiconductor device with both I/O and core components and method of fabricating same | Chung Long Cheng, Sheng-Chen Chung, Harry-Hak-Lay Chuang, Mong-Song Liang | 2011-01-11 |