Issued Patents 2011
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7993802 | Method for correcting pattern critical dimension in photomask | — | 2011-08-09 |
| 7955760 | Method of correcting defect in photomask | Hee Chun Kim | 2011-06-07 |
| 7901844 | Method with correction of hard mask pattern critical dimension for fabricating photomask | — | 2011-03-08 |
| 7901849 | Photomask and method of fabricating the same | — | 2011-03-08 |