Issued Patents 2011
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8049042 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | Hikaru Momose, Tadashi Nakamura, Akifumi Ueda | 2011-11-01 |