Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7932020 | Contact or proximity printing using a magnified mask image | Alfred Wong | 2011-04-26 |
| 7927928 | Spacer double patterning for lithography operations | — | 2011-04-19 |
| 7926001 | Uniformity for semiconductor patterning operations | — | 2011-04-12 |
| 7926004 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Youping Zhang | 2011-04-12 |
| 7902613 | Self-alignment for semiconductor patterns | — | 2011-03-08 |