BY

Baorui Yang

Micron: 2 patents #179 of 782Top 25%
📍 Boise, ID: #122 of 511 inventorsTop 25%
🗺 Idaho: #189 of 944 inventorsTop 25%
Overall (2011): #110,978 of 364,097Top 35%
2
Patents 2011

Issued Patents 2011

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7977017 Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect — 2011-07-12
7910270 Reticle constructions — 2011-03-22