Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8015512 | System for designing mask pattern | — | 2011-09-06 |
| 7875198 | Method of deriving etching correction values for patterns of photomask and method of fabricating photomask | Sunwook Jung | 2011-01-25 |