Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8030196 | Transistor formation using capping layer | Bong-Seok Seo, Jong-ho Yang, Dong-Hee Yu, O Sung Kwon | 2011-10-04 |
| 8021982 | Method of silicide formation by adding graded amount of impurity during metal deposition | Anthony G. Domenicucci, O Sung Kwon, Jin Woo CHOI | 2011-09-20 |
| 7927968 | Dual stress STI | Deok-kee Kim, Seong-Dong Kim | 2011-04-19 |
| 7902082 | Method of forming field effect transistors using diluted hydrofluoric acid to remove sacrificial nitride spacers | Sang-Jine Park, Richard O. Henry, Yong Siang Tan, O Sung Kwon | 2011-03-08 |
| 7863201 | Methods of forming field effect transistors having silicided source/drain contacts with low contact resistance | Yong-Kuk Jeong, Bong Seok Suh, Dong-Hee Yu, Seong-Dong Kim, O Sung Kwon | 2011-01-04 |