Issued Patents 2011
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7883578 | Process for preparing CaF2 lens blanks especially for 193 nm and 157 nm lithography with minimized deffects | Lutz Parthier, Erik Foerster | 2011-02-08 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7883578 | Process for preparing CaF2 lens blanks especially for 193 nm and 157 nm lithography with minimized deffects | Lutz Parthier, Erik Foerster | 2011-02-08 |