Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8017301 | Photosensitive polymer, resist composition, and associated methods | Sang-jun Choi, Seung-Wook SHIN, Hye Won Kim | 2011-09-13 |
| 7993810 | (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods | Sang-jun Choi, Seung-Wook SHIN, Hye Won Kim | 2011-08-09 |