Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8014587 | Pattern test method of testing, in only specific region, defect of pattern on sample formed by charged beam lithography apparatus | — | 2011-09-06 |
| 7986440 | Image processing apparatus, image forming apparatus, and control method thereof, which form an image by applying N-ary processing | Tomokazu Yanai, Atsushi Ushiroda, Hisashi Ishikawa | 2011-07-26 |