Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8052908 | Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography | Martin C. Peckerar, Mario Dagenais, John D. Barry, Michael D. Messina, Jr., Yves T. Ngu | 2011-11-08 |
| 8054450 | Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays | Martin C. Peckerar, Mario Dagenais, John D. Barry, Michael D. Messina, Jr., Yves T. Ngu | 2011-11-08 |